Nikon is preparing equipment for new production methods
At the SPIE Advanced Lithography event company Nikon has published its plans for producing 193-nanometer scanners to «wet» and «dry» lithograph.
In addition, the Japanese company has submitted an updated program of development of lithography technology in the «hard» ultraviolet (EUV). According to Nikon, using this technology, it has succeeded in creating the samples 28-nanmetrovyh chips for research facilities.
While ready to install two copies of the trial, one of which is now being used by specialists Intel. Under development is another scanner for EUV, referring to the experimental series. It will be installed at the Research Center Nikon in Japan.
With regard to equipment for immersion lithography, the company promises to release the fourth quarter scanner NSR-S620. It was introduced last year, but its detailed technical data are not yet known. This scanner should provide standards for the mass production of 32 nm or less. The product platform, which will become part of NSR-S620, will have output of 200 wafers per hour.
At the same time, the company announced a new tool for 193-nanmetrovoy «dry» lithographs, NSR-320F. Technical specifications were not published, we know only that the NSR-320F will appear on the market in 2010.
